| 摘要 |
PROBLEM TO BE SOLVED: To provide a wafer holding means which can suppress generation of slip. SOLUTION: The position of a wafer 200 is fixed by providing a gas passage 290 in a boat 217, providing gas blow-out ports 281, 282 communicating with the gas passage at a position where gas is to be blown against the bottom side of the wafer 200 and at a position where gas is to be blown against the bottom surface peripheral edge of the wafer 200 or against at least one of upper and side surfaces of the wafer 200, causing the wafer 200 to float from the boat 217 by blowing gas from the blow-out port 281 against the bottom surface of the wafer, blowing gas from the blow-out port against the bottom surface peripheral edge of the wafer 200 stronger than the central part of the wafer 200, or blowing gas from the blow-out port 282 against at least one of the upper and side surfaces of the wafer 200 substrate. COPYRIGHT: (C)2005,JPO&NCIPI |
