Plasma thin-film deposition method,申请号IL19990130115-传众专利搜索

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发明名称	Plasma thin-film deposition method
摘要
申请公布号	IL130115(D0)	申请公布日期	2000.06.01
申请号	IL19990130115	申请日期	1999.05.24
申请人	TOKYO ELECTRON LIMITED	发明人
分类号	C23C;(IPC1-7):C23C	主分类号	C23C
代理机构		代理人
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