| 摘要 |
PURPOSE: An acrylate-based copolymer for the AFM(atomic force microscopy) lithography and a method for forming the micro oxidation pattern using the copolymer are provided, to obtain the micro oxidation pattern of the size of several nanometers. CONSTITUTION: The acrylate-based copolymer is represented by the formula 1, wherein R1, R2 and R3 are H or CH3; R4 is H, CH3 or CH2CH2OH; and l+m+n = 1, 0.1<=l<=0.9, 0.05<=m <=0.8 and 0.05<=n<=0.5. Preferably the acrylate-based copolymer has a mass average molecular weight of 5,000-100,000. The method comprises the steps of forming a super thin film by using the copolymer on the surface of a semiconductor or metal substrate by spin coating; and applying the voltage locally by using AFM to form the micro oxidation pattern. Preferably the metal is Si, GaAs, Ti, Cr or Mn. |
