| 摘要 |
A pellicle is contaminated by dust and the like during the production of the pellicle by various causes. Particularly, a pellicle has a problem that the risk of adhesion of dust and the like onto the pellicle during trimming and during various treatments of a pellicle film is high. Then, the present invention provides a method for producing a pellicle for EUV use, which rarely undergoes the adhesion of dust and the like thereonto. A method for producing a pellicle, characterized by comprising forming a pellicle film on a substrate, then trimming the substrate, and then removing at least a portion of the substrate after the trimming. In the method, it is possible to remove particles adhered onto at least the surface of the pellicle film prior to the removal of the portion of the substrate. |
