发明名称 Charged particle beam writing apparatus and charged particle beam writing method
摘要 A charged particle beam writing apparatus includes plural conversion processing units to perform data conversion processing in parallel for writing data of each processing region obtained by virtually dividing the writing region of a target object into plural processing regions, a transmission unit to input a part of processing data of one of the plural processing regions for which data conversion processing has been performed, one part at a time, totally as n divided processing data, and sequentially transmit the n divided processing data such that the (n−1) th divided processing data is transmitted while the n-th divided processing data is being input, a deflection control circuit to control a deflection amount for deflecting a charged particle beam, based on one of the n divided processing data transmitted sequentially, and a writing unit to write a pattern by deflecting the charged particle beam based on the deflection amount.
申请公布号 US9478391(B2) 申请公布日期 2016.10.25
申请号 US201514620402 申请日期 2015.02.12
申请人 NuFlare Technology, Inc. 发明人 Matsumoto Hironobu
分类号 H01J37/147;H01J37/317 主分类号 H01J37/147
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A charged particle beam writing apparatus, comprising: a plurality of conversion processing units configured to perform data conversion processing in parallel for writing data of each processing region obtained by virtually dividing a writing region of a target object into a plurality of processing regions; a transmission unit configured to input a part of processing data of one of the plurality of processing regions for which the data conversion processing has been performed, one part at a time, totally as n divided processing data, and sequentially transmit the n divided processing data in a manner such that an (n−1)th divided processing data is transmitted while an n-th divided processing data is being input; a deflection control circuit configured to control a deflection amount for deflecting a charged particle beam, based on one of the n divided processing data transmitted sequentially; and a writing unit configured to write a pattern on a target object by deflecting the charged particle beam based on the deflection amount, wherein processing data of one processing region for which the data conversion processing is performed by one of the plurality of conversion processing units is divided into the n divided processing data.
地址 Yokohama JP