发明名称 |
DEVICE AND METHOD FOR PROCESSING SUBSTRATES |
摘要 |
A device and method for processing substrates, whereby medium consumption and processing time are reduced. According to the inventive method, liquid is conducted to a surface of the substrate that is to be treated via at least one nozzle that is arranged in a substantially centric position with respect to said substrate and via a plurality of second nozzles that are controlled separately from the first nozzle.
|
申请公布号 |
WO0038220(A1) |
申请公布日期 |
2000.06.29 |
申请号 |
WO1999EP08862 |
申请日期 |
1999.11.18 |
申请人 |
STEAG MICROTECH GMBH;POKORNY, JOACHIM;STEINRUECKE, ANDREAS |
发明人 |
POKORNY, JOACHIM;STEINRUECKE, ANDREAS |
分类号 |
B08B3/02;H01L21/00;H01L21/304;(IPC1-7):H01L21/00 |
主分类号 |
B08B3/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|