RESIST TREATMENT DEVICE, RESIST TREATMENT METHOD, AND RESIST PATTERN

摘要

PURPOSE:To prevent etching pattern defect and smear and enable a highly accurate etching pattern to be formed by providing at least a means for emitting ultraviolet rays onto a substrate where a resist is formed and a means for introducing an inactive gas into the device. CONSTITUTION:A substrate which is developed by exposure is dried by nitrogen gas etc. after rinsing with water and is carried into a UV chamber by a carrier arm. A gate valve 4 is closed before the substrate is placed on a hot plate 2 and an environmental gas is fully replaced by an inactive gas. At the same time when a substrate is grounded onto the hot plate 2, UV light starts to be irradiated. After emitting the UV light with a specified energy, irradiation is stopped. The temperature of the hot plate is increased, UV cure is performed at a boiling point or higher of a solvent medium which is included in a resist, a temperature below a thermal deformation temperature of the improved resists is maintained. The UV light irradiation energy can be reduced by increasing the substrate temperature at the time of irradiation.