发明名称 |
ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS |
摘要 |
<p>The invention relates to an illumination system of a microlithographic projection exposure apparatus comprising a depolariser (10, 500-900) which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser (10, 500-900) and a microlens array (20) which is arranged upstream of the light mixing system in the light propagation direction and in which a plurality of microlenses (20a, 20b,... ) are arranged with a periodicity, wherein the depolariser (10, 500-900) is such that a contribution afforded by interaction of the depolariser (10, 500-900) on the one hand with the periodicity of the microlens array (20) on the other hand, to a residual polarisation distribution occurring in a pupil plane (PP) arranged downstream of the microlens array (20) in the light propagation direction has a maximum degree of polarisation of not more than 5%.</p> |
申请公布号 |
WO2008107025(A1) |
申请公布日期 |
2008.09.12 |
申请号 |
WO2007EP60360 |
申请日期 |
2007.10.01 |
申请人 |
CARL ZEISS SMT AG;FIOLKA, DAMIAN;MAUL, MANFRED;SCHWAB, MARKUS;SEITZ, WOLFGANG;DITTMANN, OLAF |
发明人 |
FIOLKA, DAMIAN;MAUL, MANFRED;SCHWAB, MARKUS;SEITZ, WOLFGANG;DITTMANN, OLAF |
分类号 |
G02B27/28;G03F7/20 |
主分类号 |
G02B27/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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