| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a plasma treatment device using a material which has a high plasma resistance and does not easily generate particles as consumable parts around electrodes. SOLUTION: In a plasma treatment device performing plasma treatment to a workpiece mounted on a mounting stand 6 inside a treatment container 4 allowing vacuum izing, consumable parts 24, 46 provided inside the treatment container 4 are composed of a polycrystalline alumina quality sintered body with purity not less than 99.9% and bulk density 3.980 or more. Thereby, resistance to plasma is improved and close adhesion to a deposit is improved so as to make particles hard to come off.</p> |
