发明名称 ISOLIERSTOFF FÜR INTEGRIERTEN SCHALTKREIS AUS PORÖSEM SILIZIUM-OXIKARBID
摘要 <p>An integrated circuit includes at least one porous silicon oxycarbide (SiOC) insulator, which provides good mechanical strength and a low dielectric constant (e.g., epsilonR<2) for minimizing parasitic capacitance. The insulator provides IC isolation, such as between circuit elements, between interconnection lines, between circuit elements and interconnection lines, or as a passivation layer overlying both circuit elements and interconnection lines. The low dielectric constant silicon oxycarbide isolation insulator of the present invention reduces the parasitic capacitance between circuit nodes. As a result, the silicon oxycarbide isolation insulator advantageously provides reduced noise and signal crosstalk between circuit nodes, reduced power consumption, faster circuit operation, and minimizes the risk of potential timing faults.</p>
申请公布号 AT339774(T) 申请公布日期 2006.10.15
申请号 AT19980952272T 申请日期 1998.10.14
申请人 MICRON TECHNOLOGY, INC. 发明人 AHN, KIE, Y.;FORBES, LEONARD
分类号 H01L21/316;H01L21/762;H01L21/768;H01L23/522;H01L23/532;H01L29/78;(IPC1-7):H01L23/532 主分类号 H01L21/316
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