MASK AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR BY USING MASK

摘要

A mask and method for manufacturing a thin film transistor of a pixel region of an array substrate by using the mask. The mask (20) comprises a mask body (21) having a pattern region (22). The pattern region (22) comprises: a photoresist partial removal region (221) for removing a part of photoresist; a photoresist complete removal region (223) for removing all of the photoresist; and a first photoresist retaining region (222) provided between and contiguous with the photoresist partial removal region (221) and the photoresist complete removal region (223) to retain the photoresist. The first photoresist retaining region (222) is used to adjust and improve an appearance of a photoresist portion corresponding to the photoresist partial removal region (221) after exposure and developing.