| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a step-type proximity exposure method by which exposure accuracy in an initial step can be increased even when a posture of a mask stage changes when the stage is vertically moved during maintenance. <P>SOLUTION: The exposure device is equipped with: a mask posture change detecting means 30, KM1, KM2 which detects a change amount in the posture of a mask M with respect to a substrate stage 2 after the mask stage 1 is vertically moved by a vertical moving mechanism 50 for maintenance; and a mask posture adjusting means 60, 10, 12 which adjusts the posture of the mask M via the mask stage 1 by referring a feeding direction by a stage feeding mechanism 5, 6 based on the posture change amount detected by the mask posture change detecting means. <P>COPYRIGHT: (C)2007,JPO&INPIT |
