| 摘要 |
A susceptor and a semiconductor manufacturing apparatus are provided to form a uniform thin film on the entire surface of a substrate by transferring uniformly the heat to a loaded substrate using a pocket with a tilted plane. A susceptor of a semiconductor manufacturing apparatus is used for forming a film on a substrate. The susceptor(23) includes one or more pockets. Each pocket(230) has a tilted plane(240) with an angle. The angle of the tilted plane is in the range of 0 to -10 degree. The angle of the tilted plane is the same as those of the other tilted planes in pockets or different from each other. The depth of the tilted plane of the pocket is in the range of 10 mm or less. The susceptor is made of carbon or aluminum nitride.
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