发明名称 |
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD |
摘要 |
The invention provides a substrate processing device and a substrate processing method for cooling a substrate, which are capable of conveying a substrate in a cleaner condition. A substrate cooling device serving as a substrate processing device of an embodiment of the invention includes: a chamber; a cooling unit which performs cooling; a substrate holder which is provided with a substrate mounting surface for mounting a substrate inside the chamber, and is cooled by the cooling unit; and a shield which is provided with a side surface portion surrounding a lateral side of the substrate mounting surface inside the chamber, and is cooled by the cooling unit. Moreover, a shield heater is provided in the vicinity of a surface on the inside of the shield. |
申请公布号 |
US2016240406(A1) |
申请公布日期 |
2016.08.18 |
申请号 |
US201615137347 |
申请日期 |
2016.04.25 |
申请人 |
CANON ANELVA CORPORATION |
发明人 |
Kajihara Yuji |
分类号 |
H01L21/67;F25B9/00;F25B9/02;H01L43/12;H01L43/02;H01L43/08;H01L43/10;F25B9/14;H05B1/02 |
主分类号 |
H01L21/67 |
代理机构 |
|
代理人 |
|
主权项 |
1. A substrate processing device comprising:
a chamber with inside capable of being evacuated; a substrate holder provided inside the chamber and including a substrate mounting surface capable of cooling a substrate; a shield provided inside the chamber and including a side wall portion provided to surround a lateral side of the substrate mounting surface; and shield cooling unit configured to cool the shield before the substrate is mounted on the substrate mounting surface. |
地址 |
Kawasaki-shi JP |