发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a bipolar transistor that can establish a high gain and a high speed when the transistor is subject to microfabrication. SOLUTION: The semiconductor device has an external base area 7 with a larger band gap than a base area 5 on the side face of the base area. The base area 5 typically uses silicon-germanium. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008226896(A) 申请公布日期 2008.09.25
申请号 JP20070058718 申请日期 2007.03.08
申请人 HITACHI LTD 发明人 WASHIO KATSUYOSHI
分类号 H01L21/331;H01L29/737 主分类号 H01L21/331
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