| 摘要 |
An object is projected through the lens system to be corrected to the image plane where the position of the diffraction limited ideal image is readily ascertainable. At least one primary image defect or Seidel Aberration is measured. These aberrations include distortion, curvature of field or Petzval curvature, spherical aberration, coma, and astigmatism. Interferometry is one technique typically used to measure the aberrations of the system. Based on the measurements, the location of an apparent object is computed. The apparent object is an imaginary location of the object which would cause the image of the object to register to the diffraction limited ideal image. Although only one corrector plate may be required to achieve the desired optical system performance improvements, in the preferred embodiment at least two corrector plate mounting planes are designed and mounts made for the insertion of first and second corrector plates to correct beam convergence and focus to the ideal image. In the analysis offered, provision is made to insert to a medial location a phase conjugate plate for the correction of systematic lens system errors. A matrix of test points is utilized to locally correct, on an individually measured basis, lens systems through customized corrector plates individually tailored to each lens system. There results a simplified lens system correctly customized to each particular lens system which assists in approaching the diffraction limit of the optical system. Both the process and the product of the process can be used to either improve existing lens trains or ease the fabrication of new lens trains.
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