| 摘要 |
PROBLEM TO BE SOLVED: To provide a salt used for a resist composition capable of manufacturing a resist pattern by excellent line edge roughness, an acid generator and the resist composition.SOLUTION: There are provided a salt represented by the formula (I), an acid generator and a resist composition. (I), where Qand Qis each a fluorine atom or a perfluoroalkyl group, Rand Rare each a hydrogen atom, a fluorine atom or the like, z is an integer of 0 to 6, Xis *-CO-O-, *-O-CO- or *-O-, Lis an alkanediyl group, Ris an alicyclic hydrocarbon group which may be substituted by a hydroxy group, 2 hydrogen atoms contained in the group are substituted by an oxygen atom and the 2 oxygen atoms may form a ketal ring which may contain a fluorine atom and a methylene group contained in the alicyclic hydrocarbon group may be substituted by an oxygen atom or a carbonyl group and Zrepresents an organic cation.SELECTED DRAWING: None |
