| 发明名称 | Load simulator | ||
| 摘要 | A load simulator includes a passive element, two electrode plates that are connected to the passive element, and a bias applier. The bias applier is a coil spring, for example, and is provided between the two electrode plates. The bias applier biases at least one of the two electrode plates in a predetermined direction. The two electrode plates are disposed so as to be substantially parallel with each other, for example, and the bias applier biases the two electrode plates in the direction of separation from each other. | ||
| 申请公布号 | US9425024(B2) | 申请公布日期 | 2016.08.23 |
| 申请号 | US201213429701 | 申请日期 | 2012.03.26 |
| 申请人 | DAIHEN Corporation | 发明人 | Tabuchi Isao |
| 分类号 | G01P3/54;G01P3/66;H01J37/32;G01R27/28 | 主分类号 | G01P3/54 |
| 代理机构 | Hamre, Schumann, Mueller & Larson, P.C. | 代理人 | Hamre, Schumann, Mueller & Larson, P.C. |
| 主权项 | 1. A load simulator comprising: two electrode plates movable relative to each other; a passive element that functions as a simulated load, provided independently of the two electrode plates and electrically connected to the two electrode plates; a bias applier that biases at least one of the two electrode plates in a predetermined direction; a circuit having wiring that connects the passive element and the two electrode plates; and an insulator supported by one of the two electrode plates; wherein the passive element and the circuit are disposed between the two electrode plates, and the insulator is disposed so as to surround the circuit and configured to extend from said one of the two electrode plates toward the other one of the two electrode plates so as to exceed a height of the passive element in the predetermined direction, and wherein the bias applier biases the two electrode plates so as to respectively be brought into direct contact with and pressed against two electrodes in a chamber of a plasma processing apparatus. | ||
| 地址 | Osaka JP | ||