LIQUID PROCESSING APPARATUS AND CLEANING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a liquid processing apparatus and a cleaning method capable of cleaning a place except around drain parts in an exhaust path.SOLUTION: A liquid processing apparatus 10 includes: an exhaust part 76 which is provided in the vicinity of drain parts 71 to 74, and which exhausts atmosphere around a substrate W held by a substrate holding part 52; an exhaust path formation member 66 which forms an exhaust path 77 communicated with the exhaust part 76; and a first cleaning part 90 which supplies cleaning liquid to the exhaust path formation member 66 on an exhaust path 77 side.SELECTED DRAWING: Figure 2