发明名称 Power semiconductor substrates with metal contact layer and method of manufacture thereof
摘要 A power semiconductor substrate comprising an insulating planar base, at least one conductor track and at least one contact area as part of the conductor track, wherein a layer of a metallic material is disposed on the contact area by means of pressure sintering. The associated method comprises the steps of: producing a power semiconductor substrate that includes a planar insulating base, conductor tracks and contact areas; arranging a pasty layer, composed of a metallic material and a solvent, on at least one contact area of the power semiconductor substrate; and applying pressure to the pasty layer.
申请公布号 US2009008784(A1) 申请公布日期 2009.01.08
申请号 US20080152021 申请日期 2008.05.12
申请人 SEMIKRON ELEKTRONIK GMBH & CO. KG 发明人 GOBL CHRISTIAN;BRAML HEIKO
分类号 H01L23/48;H01L21/44 主分类号 H01L23/48
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