发明名称 HETEROLEPTIC CYCLOPENTADIENYL TRANSITION METAL PRECURSORS FOR DEPOSITION OF TRANSITION METAL-CONTAINING FILMS
摘要 Methods and compositions for depositing a film on one or more substrates inciude providing a reactor with at least one substrate disposed in the reactor. At least one metal precursor are provided and at least partially deposited onto the substrate to form a metal-containing film. Methods for forming heteroleptic amidinate or guanidinate cydopentadieny! containing transition metal precursors through synthesis reactions are also included.
申请公布号 WO2010010538(A2) 申请公布日期 2010.01.28
申请号 WO2009IB53252 申请日期 2009.07.24
申请人 L'AIR LIQUIDE-SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE;DUSSARRAT, CHRISTIAN;LANSALOT-MATRAS, CLEMENT 发明人 DUSSARRAT, CHRISTIAN;LANSALOT-MATRAS, CLEMENT
分类号 C23C16/18;C07F17/02 主分类号 C23C16/18
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