发明名称 |
NEGATIVELY CHARGED SUBSTRATE POLISHING METHOD AND MANUFACTURING METHOD OF NEGATIVELY CHARGED SUBSTRATE WITH HIGH SURFACE SMOOTHNESS |
摘要 |
A polishing method is provided which yields a negatively charged substrate with excellent surface smoothness with good productivity while achieving high polishing speeds. Also provided is a method for achieving a negatively charged substrate with high surface smoothness. In this method of manufacturing a negatively charged substrate using a polishing slurry, the polishing slurry contains an oxide represented by compositional expression ABO3 (A represents at least one element selected from the group consisting of Sr and Ca. B represents at least one element selected from the group consisting of Ti, Zr and Hf.) and zirconium oxide, and the polishing method involves carrying out, at least once each, a polishing step a for polishing a negatively charged substrate under conditions in which the zeta potential of the polishing slurry becomes positive, and a polishing step b for polishing the negatively charged substrate under conditions in which the zeta potential of the polishing slurry becomes negative. |
申请公布号 |
WO2016136447(A1) |
申请公布日期 |
2016.09.01 |
申请号 |
WO2016JP53699 |
申请日期 |
2016.02.08 |
申请人 |
SAKAI CHEMICAL INDUSTRY CO., LTD. |
发明人 |
KOIZUMI, Hisao;KAWASAKI, Yuji;TAKAHASHI, Naoto;HASHIMOTO, Hiroki;KATO, Ryoichi;YAMAMOTO, Tsutomu;MIKAMI, Masaru;WADA, Mizuho |
分类号 |
B24B37/04;B24B37/00;C03C19/00;C09G1/02;C09K3/14;H01L21/304 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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