Heat Beam Film-Forming Apparatus

摘要

To form a film by generating molecular species which can react at a low temperature, especially, 100° C. or less at which a substrate is not deformed or altered. In a heat beam heating device which instantaneously heats a source gas to a high temperature to cause the source gas to collide with a metal wall including a catalytic function, activated molecular species are generated by a nonequilibrium reaction, sprayed on, and brought into contact with a substrate to form a film.

主权项

1. A heat beam film-forming apparatus comprising:
a source gas instantaneously-heating mechanism including a flow path structure which causes a source gas heated to a high temperature to repeatedly collide at a high speed with a metal material containing an element including a catalytic function; and a substrate supported at a temperature lower than a temperature of the source gas instantaneously-heating mechanism, wherein a generated gas generated through the source gas instantaneously-heating mechanism is sprayed and brought into contact with the substrate to form a film.