| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a photomask, by which a transfer pattern with high dimensional accuracy can be formed.SOLUTION: A method for manufacturing a photomask having a transfer pattern obtained by patterning an optical film on a transparent substrate is provided; and the method includes the steps of: preparing a photomask substrate; drawing a pattern; forming a resist pattern; and patterning an optical film. The step of patterning the optical film includes: first etching to etch the optical film for a predetermined time; measurement of a dimension of a monitor pattern; and second etching to additionally etch the optical film based on the dimension of the monitor pattern obtained by the above measurement. |
