发明名称 |
Partialdruckregelung von Gas zur Optimierung eines Verfahrens |
摘要 |
<p>A main regulation valve (24) controls total pressure of gas mixture in the vacuum enclosure (8) as a function of total pressure set point. An auxiliary regulation valve (29) held below a secondary pump (9), is controlled as a function of delivery pressure set point to modify delivery pressure of the pump and to adapt its pumping capacity selectively for adjusting the proportions of gases in mixture of the enclosure. An independent claim is also included for the controlling method of low pressure gas mixture in vacuum enclosure.</p> |
申请公布号 |
DE602005004640(D1) |
申请公布日期 |
2008.03.20 |
申请号 |
DE20056004640T |
申请日期 |
2005.11.18 |
申请人 |
ALCATEL LUCENT |
发明人 |
DESBIOLLES, JEAN-PIERRE;PUECH, MICHEL |
分类号 |
F04D19/04;F04D27/00 |
主分类号 |
F04D19/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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