CHEMICAL VAPOR DEPOSITION APPARATUS

摘要

PURPOSE: A chemical vapor deposition apparatus capable of depositing a thin film on a wafer loaded on a boat in a uniform thickness by making uniform a flow of a reactive gas in an inner pipe is provided. CONSTITUTION: The chemical vapor deposition apparatus comprising: a boat(150), a plurality of wafers are loaded in an inside of the boat(150); a double reaction pipe(110) including a inner pipe(112) for enclosing the boat(150) and an outer pipe(114) arranged at an outer side of the inner pipe(112); a heating source(120) arranged at an outer side of the outer pipe(114) of the double reaction pipe(110) for heating the double reaction pipe(110); a gas supply pipe(130) for supplying reactive gas into the inner pipe(112) of the double reaction pipe(110); and a gas discharge pipe(140) installed between the inner pipe(112) and outer pipe(114) for discharging the reactive gas to an outside of the double reaction pipe(110).