发明名称 |
Process for the modification of substrate surfaces through the deposition of amorphous silicon layers followed by surface functionalization with organic molecules and functionalized structures |
摘要 |
Functionalized substrates and method of passivating the surface of a substrate to improve the surface by imparting desirable surface properties to improve the performance of a surface, the method steps including exposing the substrate to a chemical vapor deposition process to coat the substrate with silicon, and functionalizing the coated surface by exposing the substrate surface to a binding reagent having at least one unsaturated hydrocarbon group.
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申请公布号 |
US2009029178(A1) |
申请公布日期 |
2009.01.29 |
申请号 |
US20050302309 |
申请日期 |
2005.12.13 |
申请人 |
SMITH DAVID A;BARONE GARY A;HIGGINS MARTIN E |
发明人 |
SMITH DAVID A.;BARONE GARY A.;HIGGINS MARTIN E. |
分类号 |
B32B9/04;C23C16/24 |
主分类号 |
B32B9/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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