发明名称 Deposition of thin layers under vacuum - by ion bombardment of high melting point materials e.g. platinum
摘要 <p>Appts. comprises a vacuum chamber; an ionisation gun fixed to the chamber; a sample holder allowing the sample to be coated, to be held out of the ion beam in a position which is adjustable in translation in a given direction or in rotation around an axis perpendicular to the beam or both; and means for holding a piece of material e.g. carbon, to be deposited at an adjustable angle of incidence w.r.t. the beam and in a position in which it intercepts an adjustable fraction of the beam.</p>
申请公布号 FR2204709(A1) 申请公布日期 1974.05.24
申请号 FR19720038212 申请日期 1972.10.27
申请人 ANVAR,FR 发明人
分类号 C23C14/46;H01J37/305;(IPC1-7):23C15/00 主分类号 C23C14/46
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