发明名称 Base plate and lithographic plate prepared by sensitization thereof
摘要 A base plate adapted to be coated with a light-sensitive diazo resin, and a lithographic plate which may be prepared therefrom. The base plate includes a substrate comprising a metal support and having a water-wettable, hydrophilic surface. Over the substrate and in direct contact with the surface is a layer comprising an oleophilic ink-receptive organic resin adapted to receive a light-sensitive coating comprising a diazo resin sensitizer. The oleophilic resin layer is permeable to the sensitizer so that it may penetrate substantially through the resin layer to establish sufficient contiguity between the diazo resin and the substrate so that both the light-sensitive coating and the organic resin layer become anchored to the substrate in the areas of exposure when the light-sensitive coating is exposed to light. Methods of preparing the base plate and lithographic plate are also disclosed.
申请公布号 US4272604(A) 申请公布日期 1981.06.09
申请号 US19790075215 申请日期 1979.09.13
申请人 WESTERN LITHO PLATE & SUPPLY CO. 发明人 MEADOR, JIM D.;PARKER, EDWARD H.
分类号 B41N3/03;(IPC1-7):G03C1/54;G03C1/60;G03C7/08;B41N1/08 主分类号 B41N3/03
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