发明名称 PATTERN DETECTOR
摘要 PURPOSE:To improve the reliability of arithmetic processing for position detection even when a detection signal has low contrast by processing a corrected signal for the position detection. CONSTITUTION:An equation 1 holds, where h(x) is the intensity distribution of an image of a point pattern on a wafer which is formed through the optical pattern detection system including a reduction lens 4 and an optical enlargement system 9, f(x) is the an intensity distribution indicating the light-dark level of the pattern itself of the wafer, and g(x) is the intensity distribution of the detection signal 24. A function f'(x) shown by an equation 2 close to the f(x) is calculated by using some filter function t(x) to correct the detection signal and then a decrease in the contrast depending upon MTF characteristics of the optical detection system is recovered. For the purpose, the t(x) is calculated and stored in a memory 17 and a weighted mean shown by an equation 3 equivalent to the equation 2 is calculated for a signal g(x) stored in a memory 15 by using a product sum arithmetic part 18 and an address control part 19 and stored in a memory 21, obtaining a detection signal 25 which is made sharp.
申请公布号 JPS61247902(A) 申请公布日期 1986.11.05
申请号 JP19850088504 申请日期 1985.04.26
申请人 HITACHI LTD 发明人 TERASAWA TSUNEO;KUROSAKI TOSHISHIGE;KAWAMURA YOSHIO;KUNIYOSHI SHINJI
分类号 H01L21/68;G01B11/00;G06K9/00;G06T1/00;H01L21/66 主分类号 H01L21/68
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