| 摘要 |
Ion source filaments, as well as methods and apparatus associated with the same are provided. The source filaments have a design that includes a relatively small surface area from which electrons are emitted (i.e., active portion) as compared to certain conventional source filaments. Suitable designs include filaments that have a V-shape or U-shape active portion, rather than a coiled active portion as in certain conventional source filaments. The source filaments of the present invention can increase the efficiency of ion generation and, in particular, the generation of multiply charged ionic species. The increased ion generation efficiency may enable formation of ion beams having relatively high beam currents suitable for implantation.
|
