CHEMICAL AMPLIFICATION TYPE RADIATION SENSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a chemical amplification type radiation sensitive resist composition which has high sensitivity and high definition to radiation including electron beams, is free of swelling and has high resolution and a pattern forming method using the same.

SOLUTION: The chemical amplification type radiation sensitive resist composition containing a sulfonium salt having a group linked or ring condensed with ≥2 aromatic structures having small ionization potential and high sensitivity to ion beams and iodonium salt is used.

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