发明名称 Uses for buried contacts in integrated circuits
摘要 An integrated circuit is made that includes an insulated gate transistor and a buried contact. The buried contact is used to divide an active device area in two discrete parts, that are doped during source-drain doping in other active device mesas of the integrated circuit. Discrete contacts to these regions, along with the buried contact, provide an additional type of electrical component in the integrated circuit, such as a bipolar lateral transistor.
申请公布号 US4547959(A) 申请公布日期 1985.10.22
申请号 US19830468149 申请日期 1983.02.22
申请人 GENERAL MOTORS CORPORATION 发明人 RUSCH, RANDY A.
分类号 H01L21/74;H01L21/8249;H01L29/735;(IPC1-7):H01L21/82;H01L21/90 主分类号 H01L21/74
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