| 摘要 |
<p>A system for depositing photo resist using chemical vapor deposition ('CVD') onto a semiconductor substrate is disclosed. The system includes a processing chamber and a gas chamber. The gas chamber receives a monomer and supplies sufficient energy for polymerization of the monomer, thereby creating a polymer vapor. The processing chamber receives the semiconductor substrate and the polymer vapor. CVD occurs and the polymer vapor deposits a thin layer photo resist on the surface semiconductor substrate.</p> |
