CHEMICAL VAPOR DEPOSITION EQUIPMENT FOR FABRICATING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A chemical vapor deposition equipment for fabricating a semiconductor device is provided to improve uniformity of a layer formed on a wafer and enhance production yield by conformally distributing processing gas using a gas lead wing. CONSTITUTION: A chemical vapor deposition equipment for fabricating a semiconductor device comprises an inside tube, an outside tude, a gas injector, a gas lead wing, a gas exhauster, and a heater. A wafer boat including many wafers therein is installed in the inside tube of which an upper side is an opened tube. The outside tube is made of sealed tube to isolate the inside tube from outside device. The gas lead wing makes the processing gas flow toward the wafer. The gas exhauster exhausts the processing gas completing a process. The heater heats the outside tube to heat the inside tube and the wafer.