发明名称 |
Dielectric structure for antennas in RF applications |
摘要 |
A dielectric structure for positioning adjacent to an active element of an antenna for radio frequency (RF) applications, the dielectric structure comprising: a plurality of individual dielectric material layers in a stacked layer arrangement including a first layer including a first dielectric material and a second layer including a second dielectric material. |
申请公布号 |
US9496596(B2) |
申请公布日期 |
2016.11.15 |
申请号 |
US201113520739 |
申请日期 |
2011.01.06 |
申请人 |
Symbol Technologies, LLC |
发明人 |
Chirila Laurian Petru |
分类号 |
H01Q1/22;H01Q1/38;H01Q5/364;H01Q1/52;H01Q9/04 |
主分类号 |
H01Q1/22 |
代理机构 |
|
代理人 |
|
主权项 |
1. A dielectric structure positioned adjacent to an active element of an antenna for a radio frequency (RF) application, the dielectric structure comprising:
a plurality of individual layers in a stacked layer arrangement including a first layer having a top surface and an opposing bottom surface and including a first RF dielectric material, a second layer adjacent to and in contact with the first layer, the second layer having a top surface and an opposing bottom surface and including a second RF dielectric material, a third layer adjacent to and spaced apart from the second layer by a predetermined distance to form a gap layer between the second layer and the third layer; a passage in the third layer configured to route a grounding line to a ground element of the antenna, the ground element disposed below the third layer; and at least one non-conductive mechanical fastening mechanism configured to couple the plurality of individual layers to one another and to inhibit short-circuiting the active element with the ground element of the antenna. |
地址 |
Holtsville NY US |