发明名称 THIN-FILM CAPACITOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a thin-film capacitor for drastically reducing volume and costs, and improving electric performance. SOLUTION: On a surface 11 of a carrier moving in a vacuum state, the settlement of a dielectric gas, a mask, and the settlement of an electrode gas are made, and also the treatment is repeatedly made, thus forming a thin-film capacitor mother board where dielectric and electrode layers 9 and 8 are alternately laminated. Then, the mother plate is cut and divided for forming a chip. A metal-leading surface 11 is formed on both end faces of the chip, thus forming the thin-film capacitor where volume is greatly decreased, cost is reduced, and electric characteristics are improved.
申请公布号 JP2002057065(A) 申请公布日期 2002.02.22
申请号 JP20000339426 申请日期 2000.11.07
申请人 WANG XICHENG 发明人 WANG XICHENG
分类号 C23C14/06;C23C16/30;H01G4/12;H01G4/30;H01G4/33;H01G13/00;(IPC1-7):H01G4/33 主分类号 C23C14/06
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