发明名称 EXCHANGER AND GAS REPLACING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a gas replacing device that does not require a conventional container 1 and its lid 3 to be remanufactured and is capable of shortening a time for replacement of gas with another, which replaces the air inside a container 1 carrying semiconductor wafers with nitrogen gas or the like. <P>SOLUTION: A container 1 is housed in a chamber 5, a lid 3 for the container 1 is opened by an internal opening mechanism 7, the chamber 5 is exchanged by a vacuum pump 9, and nitrogen gas is supplied to the chamber 5. The lid 3 of the container 1 is closed, and then the container 1 is taken out from the chamber 5. <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003168727(A) 申请公布日期 2003.06.13
申请号 JP20010365703 申请日期 2001.11.30
申请人 DAINICHI SHOJI KK;TDK CORP 发明人 ISHIKAWA TOSHIO;ARAYA SHINICHI;MIYAJIMA TOSHIHIKO;ISHIYAMA SHIGEKI
分类号 H01L21/673;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/673
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