发明名称 |
SINGLE-WAFER WASHING DEVICE FOR SEMICONDUCTOR SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a single-wafer basis washing device for a semiconductor substrate which can reduce washing process time by finishing washing process by observing the removal state of a surface oxide film without depending on washing time. SOLUTION: The device has a casing 2; a rotary table 4 which is provided to the casing 2, and rotated and driven by a driving shaft 3 and whereon a semiconductor substrate W is mounted and fixed; a washing solution supply nozzle 5 which is provided to supply washing solution to the surface of the semiconductor substrate W; and an oxide film detection sensor 6 which detects the removal state of an oxide film of a surface of the semiconductor substrate W and is provided to optically face the surface of the semiconductor substrate. COPYRIGHT: (C)2003,JPO
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申请公布号 |
JP2003249477(A) |
申请公布日期 |
2003.09.05 |
申请号 |
JP20020049994 |
申请日期 |
2002.02.26 |
申请人 |
TOSHIBA CERAMICS CO LTD |
发明人 |
KURITA HISATSUGU;TANABE ATSUSHI |
分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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主权项 |
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地址 |
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