发明名称 |
Method of manufacturing split-gate memory |
摘要 |
A method of manufacturing split-gate memory provides a control gate insulating film and the tunneling insulating film in a cell region, a high voltage gate insulating film in a high voltage region, and a low voltage gate insulating film in a low voltage region, all having different thickness. Additionally, a pre-cleaning process removes an outer sidewall portion of a spacer to form a tip portion of a floating gate that overlaps a control gate line formed proximate the floating gate.
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申请公布号 |
US6977200(B2) |
申请公布日期 |
2005.12.20 |
申请号 |
US20040982784 |
申请日期 |
2004.11.08 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM YONG-HEE;KWON CHUL-SOON;KIM JIN-WOO;KIM JOO-CHAN;KIM DAE-GEUN;RYU EUI-YOUL |
分类号 |
H01L21/28;H01L21/336;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/336 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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