| 摘要 |
PROBLEM TO BE SOLVED: To provide clay slurry that enables the formation of a clay film having excellent water resistance by heat treatment at a lower temperature than before.SOLUTION: The clay slurry comprises (A) a laminar silicate compound, (B) a carboxy group-containing resin, (C) a crosslinking agent having a functional group having reactivity with a carboxy group, and water (D).SELECTED DRAWING: None |
