| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a vapor-deposited aluminum oxide film excellent in transparency and gas barrier characteristic even in the case of a thick vapor-deposited layer. SOLUTION: In the method for manufacturing the vapor-deposited aluminum oxide film, aluminum metal is heated and evaporated to form a vapor-deposited layer of aluminum oxide on a base material composed of a plastic film, which is further immersed in water or in a water base solution of pH 4 to 11, by which transparency and gas carrier characteristic are improved. The thickness of the vapor-deposited layer of aluminum oxide can be made to 20 nm to 300 nm.
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