Plasma resistant quartz glass jig.

摘要

It is an object of the present invention to provide a quartz glass jig excellent in the plasma etching resistant characteristics, which does not generate an abnormal etching and particles when used for a plasma generating apparatus. The above Object is obtained by a plasma resistant quartz glass jig that is used for an apparatus of generating plasma, wherein the surface roughness Ra of the quartz glass surface is in a range of from 5 mu m to 0.05 mu m, the number of microcracks of the surface is not more than 500 microcracks/cm<2>, and the hydrogen molecule concentration in the quartz glass is at least 5 x 10<16> molecules/cm<3>.