| 发明名称 |
PHOTOSENSITIVE FLUID MANUFACTURE METHOD |
| 摘要 |
PURPOSE:To manufacture a photosensitive fluid of high photosensitivity by removing impurities easily in a short time from a reactant fluid containing a photosensitive resin on preparing it. |
| 申请公布号 |
JPS5213313(A) |
申请公布日期 |
1977.02.01 |
| 申请号 |
JP19750089170 |
申请日期 |
1975.07.23 |
| 申请人 |
MITSUBISHI CHEM IND |
发明人 |
TAZAWA SHIGEO;KAWATSU TOSHITERU;KITSUUCHI MINORU;TANAKA EIICHIROU |
| 分类号 |
H05K3/00;G03C1/72;G03F7/038;H01L21/027 |
主分类号 |
H05K3/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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