发明名称 |
Purged lower liner |
摘要 |
Chemical vapor deposition apparatus 10 which includes a chemical vapor deposition processing chamber 12 having a base ring 18 and upper and lower quartz windows 20 and 22, and a quartz liner 26 lining the base ring 18, wherein a purge channel 46 is formed, in an outer surface of the liner 26, to remove contaminant material from an interface between the base ring 18 and the liner 26.
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申请公布号 |
US5914050(A) |
申请公布日期 |
1999.06.22 |
申请号 |
US19970934920 |
申请日期 |
1997.09.22 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
COMITA, PAUL B.;CARLSON, DAVID K.;KLINCK, KIMBERLY E.;MELLEN, III, HAROLD J. |
分类号 |
C23C16/44;C23C16/48;H01L21/205;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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