发明名称 |
Two-phase ammonia, for metal organic chemical vapor deposition of gallium nitride based layers in production of semiconductor devices such as blue-emitting light emitting devices, has a liquid phase with a specified low water content |
摘要 |
Two-phase ammonia, having a liquid phase with a specified low water content, is new. Two-phase ammonia, for supply together with an organometallic compound gas from a container to a reaction chamber for gallium nitride (GaN) semiconductor production, fills the container partially as a gaseous phase and partially as a liquid phase with a water content of /}0.5 vol.% (as determined by Fourier transform infrared spectroscopy). An Independent claim is also included for production of a GaN semiconductor having a substrate bearing a GaN layer produced using the above two-phase ammonia.
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申请公布号 |
DE19963283(A1) |
申请公布日期 |
2000.07.06 |
申请号 |
DE19991063283 |
申请日期 |
1999.12.27 |
申请人 |
SHOWA DENKO K.K., TOKIO/TOKYO |
发明人 |
HAYASHIDA, HIDEKI;ITO, TAIZO;SAKAGUCHI, YASUYUKI |
分类号 |
C01C1/00;C23C16/30;C23C16/44;C23C16/448;C30B25/02;(IPC1-7):C01C1/00;C30B29/38;C30B23/00;C30B25/00 |
主分类号 |
C01C1/00 |
代理机构 |
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代理人 |
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地址 |
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