发明名称 |
Polymer compound, method of producing the same, photosensitive composition, and pattern formation method |
摘要 |
<p>The present invention provides a cross-linkable polymer compound which can be developed with an aqueous developer and exhibits excellent patterning properties; a photosensitive composition containing the same; and a pattern formation method employing the composition. The polymer compound containing monomer units represented by formulas (I) to <CHEM> <CHEM> <CHEM> wherein each of R1 to R4 is hydrogen and/or a methyl group; p represents an integer between 1 to 10 inclusive; X represents hydrogen, an alkali metal, or an ammonium represented by formula (1): <CHEM> wherein each of R5 to R8 represents hydrogen, a C1-C3 alkyl group, or a C1-C3 alkanol group; and a plurality of Xs may be the same or different from one another, the compositional proportions of the monomer units falling within the following ranges: 2 mol% ≤ 1 ≤ 73 mol%; 8 mol% ≤ m ≤ 83 mol%; and 15 mol% ≤ n ≤ 80 mol%.</p> |
申请公布号 |
EP1117005(A1) |
申请公布日期 |
2001.07.18 |
申请号 |
EP20010101002 |
申请日期 |
2001.01.17 |
申请人 |
TOYO GOSEI KOGYO CO., LTD. |
发明人 |
UTSUNOMIYA, SHIN;YAMADA, SEIGO |
分类号 |
G03F7/004;C08F2/50;C08F8/00;C08F220/06;C08F220/28;C08F290/06;C08F290/12;C08F299/00;G03F7/038;(IPC1-7):G03F7/038;C08F222/10 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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