| 摘要 |
The invention provides a face position detection method and a face position detection apparatus which can perform detection of the face position of a substrate with high precision, even when a pattern having a large stepped portion is formed by means of a plurality of layers on the surface of the substrate, and an exposure method and an exposure apparatus. Measurement beams S1 to S9 are irradiated onto a plurality of places on the surface of a substrate (object) W using a beam irradiation system (irradiation system) 4, the plurality of measurement beams S1 to S9 from the surface of the substrate W are then detected using a beam reception system (detection system) 5, and face positional information for the surface of the substrate W is obtained based on the detection results for the plurality of measurement beams S1 to S9 using a signal processing unit 41. With at least one measurement beam S9 of the plurality of measurement beams, at least either one of the shape and size thereof on the surface of the substrate W is set to be smaller than at least either one of the shape and size of the other measurement beams S1 to S8 on the surface of the substrate W.
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