| 发明名称 |
WAFER TARGET FOR MASK POSITION ALIGNMENT |
| 摘要 |
PURPOSE:To make a novel wafer target which makes possible the common use of both of a scanning system and a light quantity difference system. |
| 申请公布号 |
JPS5389670(A) |
申请公布日期 |
1978.08.07 |
| 申请号 |
JP19770003950 |
申请日期 |
1977.01.19 |
| 申请人 |
HITACHI LTD |
发明人 |
TAKEI SEIICHI |
| 分类号 |
H01L21/68;H01L21/027;H01L21/302 |
主分类号 |
H01L21/68 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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