发明名称 SOLID-STATE IMAGING DEVICE, MANUFACTURING METHOD THEREFOR, AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To obtain a proper incident state for each pixel, corresponding to the distance between an optical system and the light-receiving section of a sensor, and to improve the light-receiving efficiency of each pixel and uniformizing of sensitivity. SOLUTION: In the pixel in the peripheral portion of a screen, a principal ray (a) is incident at an incidence angleθ. Thus, for the positional relation of a microlens 260, a color filter 250, wiring 220, 230, and 240, a photodiode 110, etc., they are arranged along the incident direction in matching with this incidence angleθ. The incidence angleθat this time is determined, by taking into consideration the distance from the microlens 260 to the surface of a silicon substrate 100, and the depth position from the surface of the silicon substrate 100 to the photoelectric conversion region of the photodiode 110. Moreover, the photoelectric conversion region (n-type region) of the photodiode 110 is formed in an inclined state, corresponding to the incidence angleθfor the pixel in the peripheral portion of the screen. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004134790(A) 申请公布日期 2004.04.30
申请号 JP20030328381 申请日期 2003.09.19
申请人 SONY CORP 发明人 MARUYAMA YASUSHI
分类号 H01L27/14;H04N5/335;H04N5/361;H04N5/369;(IPC1-7):H01L27/14 主分类号 H01L27/14
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